ALD - ATOMIC LAYER DEPOSITION
A New Age of Controlled Deposition by Ultrathin Multi-Layers. The process of ALD as a special CVD process fulfils the above mentioned requirements.
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PBII
Ion implantation is a unique tool to change the surface of different materials, creating new phases and alloys, far away from the thermal equilibrium.
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SPUTTERING
Das Sputterverfahren als eins von mehreren verfügbaren Technologien für die Abscheidung von Schichten im Dünnschichtbereich.
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ULTRA SHORT TIME ANNEALING
Micro- / millisecond annealing with flash lamps or laser modules. Novel thin-film technologies on innovative substrates require new annealing technologies for surface modification.
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ION IMPLANTATION
A automatic wafer handling system mounted to a 3 MV Tandetron accelerator allow the treatment of productions lots at a troughput of up to 100 wafers / h.
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HANDLING SYSTEMS FOR VACUUM EQUIPMENT
Elevators for vacuum handling. Vacuum machinery & equipment for thin film deposition requires reliable and efficient substrate handling.
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