PLASMA BASED ION IMPLANTATION AND DEPOSITION

TOOLS FOR R&D AND SMALL SCALE PRODUCTION


Advantages of PBII

  • high ion current density
  • fast processing
  • implantation & deposition of 3D-objects possible
  • no scanning system required
  • implantation time is size independent
  • improved process control
  • low cost of ownership / scalable process
PIII-300 RD
PIII-300 SH

PIII-300 RD

PIII-300 SH

Applicatio

• doping of solar cells /wafers
• dopants: Diborane, BF3, PH3

• deposition (hard & protective coatings)
• metal layers, nitrides, oxides

Chamber   

aluminium

stainless steel

Substr. size

max. 300 mm diameter,
10 mm height

3D substrates
(200 x 200 x 200 mm³)

Substr. holder

• rotatable (30 rpm),
   z-drive: 250 mm
• with water cooling

• rotatable (30 rpm),
   z-drive: 250 mm
• with water cooling

Vacuum
system

turbo pump Leybold MAG 1500CT
(resistant against corrosive gases)

turbo pump Leybold T1600

Plasma
generation

RF antenna system
(up to 10 single antennas)

• magnetrons (4 x 2” or  1 x 6”)
• optional RF antenna

Pulse voltage

up to 20 kV

up to 40 kV

Pulse duration

10 … 100 µs

10 … 100 µs